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Journal of Applied Physics

Volumn 86, Issue 1, 1999, Pages 163-167

Effects of plasma power on the epitaxial growth of (Ba0.48Sr0.52)TiO3 thin film

(4) Oh, U C a,b Kang, T S a Park, K H a,c Je, Jung Ho a

a Pohang University of Science and Technology (POSTECH) (South Korea)

b Northwestern University (United States)

c LG Electronics Inc (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; DIELECTRIC FILMS; EPITAXIAL GROWTH; FILM GROWTH; MAGNESIA; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; SUBSTRATES; THIN FILMS; X RAY SCATTERING;

BARIUM STRONTIUM TITANATE;

FERROELECTRIC MATERIALS;

EID: 0032606537 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.370712 Document Type: Article

Times cited : (5)

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