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Volumn 46, Issue 9, 1999, Pages 1883-1889

A new technique for hot carrier reliability evaluations of flash memory cell after long-term program/erase cycles

Author keywords

Flash memory; Hot carrier reliability

Indexed keywords

ELECTRIC CHARGE; ELECTRIC CURRENTS; GATES (TRANSISTOR); HOT CARRIERS; INTERFACES (COMPUTER);

EID: 0032595357     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.784189     Document Type: Article
Times cited : (12)

References (17)
  • 1
    • 0023829362 scopus 로고
    • Reliability performance of ETOX based Flash memories
    • G. Verma and N. Mielke, "Reliability performance of ETOX based Flash memories," in Proc. IEEE IRPS, 1988, pp. 158-166.
    • (1988) Proc. IEEE IRPS , pp. 158-166
    • Verma, G.1    Mielke, N.2
  • 4
    • 0028317737 scopus 로고
    • Accurate simulation of EPROM hot-carrier induced degradation using physics based interface and oxide charge generation models
    • J. Z. Peng, Q. Lin, P. Fang, M. Kwan, S. Longcor, and J. Lien, "Accurate simulation of EPROM hot-carrier induced degradation using physics based interface and oxide charge generation models," in Proc. IEEE IRPS, 1994, pp. 154-160.
    • (1994) Proc. IEEE IRPS , pp. 154-160
    • Peng, J.Z.1    Lin, Q.2    Fang, P.3    Kwan, M.4    Longcor, S.5    Lien, J.6
  • 5
    • 0024170325 scopus 로고
    • Stress induced leakage current limiting to scale down EEPROM tunnel oxide thickness
    • K. Naruke, S. Taguchi, and M. Wada, "Stress induced leakage current limiting to scale down EEPROM tunnel oxide thickness," in IEDM Tech. Dig., 1988, pp. 424-427.
    • (1988) IEDM Tech. Dig. , pp. 424-427
    • Naruke, K.1    Taguchi, S.2    Wada, M.3
  • 6
    • 0027306901 scopus 로고
    • Novel read disturb failure mechanism induced by Flash cycling
    • A. Brand, K. Wu, S. Pan, and D. Chin, "Novel read disturb failure mechanism induced by Flash cycling," in Proc. IEEE IRPS, 1993, pp. 127-132.
    • (1993) Proc. IEEE IRPS , pp. 127-132
    • Brand, A.1    Wu, K.2    Pan, S.3    Chin, D.4
  • 7
    • 0028755689 scopus 로고
    • Read-disturb degradation mechanism due to electron trapping in the tunnel oxide for low-voltage Flash memories
    • M. Kato, N. Miyamoto, H. Kume, A. Satoh, T. Adachi, M. Ushiyama, and K. Kimura, "Read-disturb degradation mechanism due to electron trapping in the tunnel oxide for low-voltage Flash memories," in IEDM Tech. Dig., 1994, pp. 45-48.
    • (1994) IEDM Tech. Dig. , pp. 45-48
    • Kato, M.1    Miyamoto, N.2    Kume, H.3    Satoh, A.4    Adachi, T.5    Ushiyama, M.6    Kimura, K.7
  • 8
    • 0024705114 scopus 로고
    • Analysis of the charge pumping technique and its application for the evolution of MOSFET degradation
    • P. Heremans, J. Witters, G. Groeseneken, and H. E. Maes, "Analysis of the charge pumping technique and its application for the evolution of MOSFET degradation," IEEE Trans. Electron Devices, vol. 36, pp. 1318-1335, 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 1318-1335
    • Heremans, P.1    Witters, J.2    Groeseneken, G.3    Maes, H.E.4
  • 9
    • 84954090727 scopus 로고
    • Channel-hot-carrier induced oxide charge trapping in nMOSFET's
    • W. Chen and T. P. Ma, "Channel-hot-carrier induced oxide charge trapping in nMOSFET's," in IEDM Tech. Dig., 1991, p. 731.
    • (1991) IEDM Tech. Dig. , pp. 731
    • Chen, W.1    Ma, T.P.2
  • 10
    • 0029774193 scopus 로고    scopus 로고
    • A new method for characterizing the spatial distributions of interface states and oxide trapped charges in LDD n-MOSFET's
    • Jan.
    • G. H. Lee, J. S. Su, and S. S. Chung, "A new method for characterizing the spatial distributions of interface states and oxide trapped charges in LDD n-MOSFET's," IEEE Trans. Electron Devices, vol. 43, pp. 81-89, Jan. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 81-89
    • Lee, G.H.1    Su, J.S.2    Chung, S.S.3
  • 11
    • 0031274351 scopus 로고    scopus 로고
    • A unified approach to profiling the lateral distributions of both oxide charge and interface states in n-MOSFET's under various bias stress conditions
    • S. M. Cheng, C. M. Yih, J. C. Yeh, S. N. Kuo, and S. S. Chung, "A unified approach to profiling the lateral distributions of both oxide charge and interface states in n-MOSFET's under various bias stress conditions," IEEE Trans. Electron Devices, vol. 44, pp. 1908-1914, 1997.
    • (1997) IEEE Trans. Electron Devices , vol.44 , pp. 1908-1914
    • Cheng, S.M.1    Yih, C.M.2    Yeh, J.C.3    Kuo, S.N.4    Chung, S.S.5
  • 12
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • S. C. Sun and J. D. Plummer, "Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces," IEEE Trans. Electron Devices, vol. ED-27, pp. 1497-1508, 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 13
    • 33747504270 scopus 로고    scopus 로고
    • A numerical model for simulating MOSFET gate current degradation by considering the interface state generation
    • Tokyo, Japan
    • C. M. Yih, S. S. Chung, and C. C.-H. Hsu, "A numerical model for simulating MOSFET gate current degradation by considering the interface state generation," in Symp. SISPAD, Tokyo, Japan, 1996, pp. 115-116.
    • (1996) Symp. SISPAD , pp. 115-116
    • Yih, C.M.1    Chung, S.S.2    Hsu, C.C.-H.3
  • 16
    • 0029197224 scopus 로고
    • Effects of erase source bias on Flash EPROM device reliability
    • K. T. San, C. Kaya, and T. P. Ma, "Effects of erase source bias on Flash EPROM device reliability," IEEE Trans. Electron Devices, vol. 42, pp. 150-159, 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , pp. 150-159
    • San, K.T.1    Kaya, C.2    Ma, T.P.3
  • 17
    • 0029238175 scopus 로고
    • Characterization and simulation of hot carrier effect on erasing gate current in flash EEPROM's
    • C. Huang, T. Wang, T. Chen, N. C. Peng, A. Chang, and F. C. Shone, "Characterization and simulation of hot carrier effect on erasing gate current in flash EEPROM's," in Proc. IEEE IRPS, 1995, pp. 61-64.
    • (1995) Proc. IEEE IRPS , pp. 61-64
    • Huang, C.1    Wang, T.2    Chen, T.3    Peng, N.C.4    Chang, A.5    Shone, F.C.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.