ArF (193 nm) laser ablation of poly(methyl methacrylate)

Diamond and Related Materials

Volumn 8, Issue 8-9, 1999, Pages 1654-1658

  Lade, R J ^a   Morley, I W ^a   May, P W ^a   Rosser, K N ^a   Ashfold, M N R ^a  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

FTIR analysis of a C:H films; Optical emission spectroscopy; Polymer targets; UV laser ablation

Indexed keywords

AMORPHOUS FILMS; ARGON; CARBON; DEPOSITION; ELECTRIC EXCITATION; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HELIUM; HYDROGEN; LASER ABLATION; PRESSURE; SODIUM CHLORIDE;

LANGMUIR PROBE MEASUREMENTS; PULSED LASER ABLATION; TEMPORALLY RESOLVED MEASUREMENTS;

POLYMETHYL METHACRYLATES;

EID: 0032594166     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(99)00053-9     Document Type: Article

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