Pulsed laser deposition of hydrogenated amorphous diamond-like carbon films from a polymer target

Journal of Applied Physics

Volumn 80, Issue 9, 1996, Pages 5398-5403

  Li, Z F ^a,b   Yang, Z Y ^a   Xiao, R F ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001043951     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362726     Document Type: Article

References (26)

1. J. C. Angus, P. Koidl, and S. Domitz, in Plasma Deposited Thin Films, edited by J. Mort and F. Jansen (CRC, Boca Raton, FL, 1986), p. 530.
2. Amorphous Hydrogenated Carbon Films, edited by P. Koidl and P. Oelhaven, E-MRS Proc. 17 (MRS, Pittsburgh, 1987).
3. J. Robertson, Prog. Solid State Chem. 21, 199 (1991).
4. A. Madan and M. P. Shaw, The Physics and Applications of Amorphous S emiconductors (Academic, New York, 1988).
5. J. C. Angus and C. C. Hayman, Science 241, 913 (1988).
6. B. Dischler, A. Bubenzer, and P. Koidl, Solid State Commun. 48, 105 (1983).
7. R. S. R. P. Silva and G. A. J. Amaratunga, Diam. Relat. Mater. 3, 817 (1994).
8. A. Grill, B. S. Meyerson, and V. V. Patel, IBM J. Res. Dev. 34, 849 (1990).
9. M. Weiler, J. Robertson, S. Sattel, V. S. Veerasamy, K. Jung, and H. Ehrhardt, Diam. Relat. Mater. 4, 268 (1995).
10. P. J. Fallon, V. S. Veerasamy, C. A. Davis, J. Robertson, G. A. J. Amaratunga, W. I. Milne, and J. Koskinen, Phys. Rev. B 48, 4777 (1993); H. Hofsass, H. Binder, T. Klumpp, and E. Recknagel, Diam. Relat. Mater. 3, 137 (1993).
11. P. J. Fallon, V. S. Veerasamy, C. A. Davis, J. Robertson, G. A. J. Amaratunga, W. I. Milne, and J. Koskinen, Phys. Rev. B 48, 4777 (1993); H. Hofsass, H. Binder, T. Klumpp, and E. Recknagel, Diam. Relat. Mater. 3, 137 (1993).
12. C. B. Collins, F. Davanloo, E. M. Juengerman, W. R. Osborn, and D. R. Jander, Appl. Phys. Lett. 54, 216 (1989); Sato, S. Furuno, S. Iguchi, and M. Hanabusa, Appl. Phys. A 45, 355 (1988); F. L. Xiong, Y. Y. Wang, V. Leppert, and R. P. H. Chang, J. Mater. Res. 8, 2265 (1993).
13. C. B. Collins, F. Davanloo, E. M. Juengerman, W. R. Osborn, and D. R. Jander, Appl. Phys. Lett. 54, 216 (1989); Sato, S. Furuno, S. Iguchi, and M. Hanabusa, Appl. Phys. A 45, 355 (1988); F. L. Xiong, Y. Y. Wang, V. Leppert, and R. P. H. Chang, J. Mater. Res. 8, 2265 (1993).
14. C. B. Collins, F. Davanloo, E. M. Juengerman, W. R. Osborn, and D. R. Jander, Appl. Phys. Lett. 54, 216 (1989); Sato, S. Furuno, S. Iguchi, and M. Hanabusa, Appl. Phys. A 45, 355 (1988); F. L. Xiong, Y. Y. Wang, V. Leppert, and R. P. H. Chang, J. Mater. Res. 8, 2265 (1993).
15. I. S. Athwal, A. Mele, and E. A. Ogryzlo, Diam. Relat. Mater. 1, 731 (1992).
16. H. Hiraoka, S. A. Latsch, and R. F. Xiao, U. S. Patent No. 5 368 681.
17. Z. F. Li, Z. Y. Yang, R. F. Xiao (unpublished).
18. R. F. Xiao, Appl. Phys. Lett. 67, 3117 (1995).
19. L. C. Chen, in Pulsed Laser Deposition of Thin Films, edited by D. B. Chrisey and G. K. Hubler (Wiley, New York, 1994), p. 169.
20. W. F. Maddams, in Analysis of Polymer Systems, edited by L. S. Bark and N. S. Allen (Applied Science Pub., London, 1982), p. 51.
21. J. Tauc, R. Grigonovici, and A. Vancu, Phys. Status Solidi 15, 627 (1966).
22. R. M. Dawson, Y. M. Li, M. Gunes, D. Heller, S. Nag, R. W. Collins, and C. R. Wronski, in Amorphous Silicon Technology, 1992 MRS Symposium Proceedings Vol. 258, edited by M. J. Thompson, Y. Hamakawa, P. G. LeComber, A. Madan, and E. Schiff (Materials Research Society, Pittsburgh, 1992), p. 5694.
23. T. Datta, J. A. Woollam, and W. Notohamiprodjo, Phys. Rev. B 40, 5956 (1989).
24. See, for example, Diamond Films and Coatings, edited by R. F. Davis (Noyes, New Jersey, 1993).
25. V. S. Veerasamy, J. Yuan, G. A. J. Amaratunga, W. I. Milne, K. W. R. Gilkes, M. Weiler, and L. M. Brown, Phys. Rev. B 48, 17954 (1993); J. Robertson and C. A. Davis, Diam. Relat. Mater. 4, 441 (1995).
26. V. S. Veerasamy, J. Yuan, G. A. J. Amaratunga, W. I. Milne, K. W. R. Gilkes, M. Weiler, and L. M. Brown, Phys. Rev. B 48, 17954 (1993); J. Robertson and C. A. Davis, Diam. Relat. Mater. 4, 441 (1995).