Dose rate dependence of the amortization of silicon carbide

Materials Research Society Symposium - Proceedings

Volumn 540, Issue , 1999, Pages 165-170

  Snead, L L ^a   Zinkle, ^a   Eatherly, ^a   Hensley, ^a   Vaughn, ^a   Jones, J W ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; COMPUTER SIMULATION; NEUTRON IRRADIATION; SILICON CARBIDE; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

DOSE RATE DEPENDENCE; SILICON ION IRRADIATION;

ION BOMBARDMENT;

EID: 0032592160     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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