Plasmons on luminescent porous silicon prepared with ethanol and critical point drying

Materials Research Society Symposium - Proceedings

Volumn 536, Issue , 1999, Pages 229-234

  Resto, O ^a   Fonseca, L F ^a   Weisz, S Z ^a   Many, A ^a   Goldstein, Y ^a  

^a UNIVERSITY OF PUERTO RICO RIO PIEDRAS   (Puerto Rico)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; AUGER ELECTRON SPECTROSCOPY; CARBON DIOXIDE; DRYING; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ETCHING; ETHANOL; ION BOMBARDMENT; SILICON CARBIDE;

ARGON ION BOMBARDMENT; CRITICAL POINT DRYING; PLASMONS;

POROUS SILICON;

EID: 0032591583     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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