메뉴 건너뛰기




Volumn 417, Issue 1, 1998, Pages 107-120

Thermodesorption mass spectrometry study of the adsorption of Sb on misoriented Si (111)

Author keywords

Adsorption kinetics; Antimony; Auger electron spectroscopy (AES); Chemisorption; Computer simulations; Silicon; Single crystal surfaces; Sticking; Surface structure, morphology, roughness, and topography; Thermal desorption

Indexed keywords

ANTIMONY; COMPUTER SIMULATION; SILICON; SINGLE CRYSTALS; SURFACE ROUGHNESS; SURFACE STRUCTURE; TEMPERATURE PROGRAMMED DESORPTION;

EID: 0032497761     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00675-X     Document Type: Article
Times cited : (8)

References (27)
  • 26
    • 0347598728 scopus 로고
    • Basic mechanisms in the early stages of epitaxy
    • E. Kaldis (Ed.), North-Holland, Amsterdam, chapter 3
    • R. Kern, G. Lelay, J.J. Métois, Basic mechanisms in the early stages of epitaxy, in: E. Kaldis (Ed.), Current Topics in Material Science, North-Holland, Amsterdam, 1978, chapter 3, p. 382.
    • (1978) Current Topics in Material Science , pp. 382
    • Kern, R.1    Lelay, G.2    Métois, J.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.