Silicon motion during antimony deposition on Si(111)

Surface Science

Volumn 345, Issue 1-2, 1996, Pages 222-234

  Ryland, Robert G ^a   Hasegawa, Shigehiko ^a,b   Williams, Ellen D ^a  

^a University of Maryland   (United States)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Antimony; Low index single crystal surfaces; Scanning tunneling microscopy; Silicon; Surface diffusion; Surface structure

Indexed keywords

ANTIMONY; DIFFUSION IN SOLIDS; ELECTRON MICROSCOPY; MASS TRANSFER; SILICON; SUBSTRATES; SURFACE STRUCTURE; VAPOR DEPOSITION;

SURFACE DIFFUSION;

SURFACE PHENOMENA;

EID: 0029755205     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)00864-0     Document Type: Article

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