Deposition conditions of SrTiO3 films on various substrates by CVD and their dielectric properties

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 71-76

  Funakubo, Hiroshi ^a   Takeshima, Yutaka ^b   Nagano, Daisuke ^a   Saiki, Atsushi ^a   Shinozaki, Kazuo ^a   Mizutani, Nobuyasu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

Dielectric property; Orientation; Strontium titanate

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; FILM PREPARATION; GRAIN GROWTH; PERMITTIVITY; STRONTIUM COMPOUNDS;

STRONTIUM TITANATE;

DIELECTRIC FILMS;

EID: 0032483898     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01119-5     Document Type: Article

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