In situ transmission electron microscope observations of misfit strain relaxation and coalescence stages of Si1 - xGex on Si(001)

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 1-5

  Hiroyama, Yuichi ^a   Tamura, Masao ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

Coalescence; Heteroepitaxy; Molecular beam epitaxy; Nucleation; Transmission electron microscopy

Indexed keywords

COALESCENCE; DISLOCATIONS (CRYSTALS); MOIRE FRINGES; MOLECULAR BEAM EPITAXY; NUCLEATION; RELAXATION PROCESSES; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

STRAIN RELAXATION;

SEMICONDUCTING FILMS;

EID: 0032483864     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01105-5     Document Type: Article

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