Solid-phase crystallization and dopant activation of amorphous silicon films by pulsed rapid thermal annealing

Applied Surface Science

Volumn 135, Issue 1-4, 1998, Pages 205-208

  Wang, Yongqian ^a   Liao, Xianbo ^a   Ma, Zhixun ^a   Yue, Guozhen ^a   Diao, Hongwei ^a   He, Jie ^a   Kong, Guanglin ^a   Zhao, Yuwen ^b   Li, Zhongming ^b   Yun, Feng ^b  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b Beijing Solar Energy Research Institute   (China)

Author keywords

Amorphous silicon; Rapid thermal annealing; Solid phase crystallization

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; DOPING (ADDITIVES); GRAIN SIZE AND SHAPE; HALL EFFECT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; THERMAL CYCLING;

SOLID-PHASE CRYSTALLIZATION;

AMORPHOUS FILMS;

EID: 0032475291     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00230-X     Document Type: Article

References (15)

1. S.D. Malhi, H. Shichijo, S.K. Banerjee, R. Sundaresan, M. Elahy, G. Pollack, W. Richardson, A.M. Shah, L.R. Hite, R.H. Womack, P.K. Chatterjee, H.W. Lam, IEEE Trans. Electron Devices ED 32 (1985) 258.
2. J. Meier, R. Fluckiger, H. Keppner, A. Shah, Appl. Phys. Lett. 65 (1994) 860.
3. J.R. Troxell, M.J. Harrington, J.C. Erskine, W.H. Dumbaugh, F.P. Fehlner, R.A. Miller, IEEE Electron Device Lett. EDL 7 (1986) 597.
4. G. Harbeke, L. Krausbauer, E. Steigmeier, A. Widmer, J. Electrochem. Soc. 131 (1984) 675.
5. M. Hatalis, D. Greve, J. Appl. Phys. 63 (1988) 2260.
6. J.E. Fair, Solid State Technol., August, 1992, p. 47.
7. R. Kakkad, J. Smith, W.S. Lau, S.J. Fonash, R. Kerns, J. Appl. Phys. 65 (5) (1989) 2069.
8. Y. Kuo, P.M. Kozlowski, Appl. Phys. Lett. 69 (8) (1996) 1092.
9. H. Richter, Z. Wang, L. Ley, Solid State Commun. 39 (1981) 625.
10. H. Kakinuma, M. Mohri, M. Sakamoto, T. Tsuruoka, J. Appl. Phys. 70 (12) (1991) 7374.
11. F. Zhu, H. Kohara, T. Fuyuki, H. Matsunami, Jpn. J. Appl. Phys. 35 (1996) 3321.
12. M.S. Benrakkad et al., Mater. Res. Soc. Symp. Proc. 343 (1994) 609.
13. H.P. Klug, L.E. Alexander, X-ray Diffraction Procedures, Wiley, New York, 1974.
14. K. Nakazawa, J. Appl. Phys. 69 (3) (1991) 1703.
15. M. Ueda, T. Imura, Y. Osaka, Jpn. J. Appl. Phys. 26 (1987) 987.