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Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 202-206

Study on stress and strain of cubic boron nitride thin films

(4) Zhang, Xingwang a Yue, Jinshun a Chen, Guanghua b Yan, Hui b

a LANZHOU UNIVERSITY (China)

b BEIJING UNIVERSITY OF TECHNOLOGY (China)

Author keywords

Boron nitride; Stress; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CUBIC BORON NITRIDE; ELASTIC MODULI; RESIDUAL STRESSES; SEMICONDUCTING SILICON; STRAIN; STRESS ANALYSIS; THIN FILMS; X RAY DIFFRACTION;

HOT FILAMENT ASSISTED RADIOFREQUENCY PLASMA CHEMICAL VAPOR DEPOSITION;

PROTECTIVE COATINGS;

EID: 0032473307 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00676-7 Document Type: Article

Times cited : (7)

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