Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 186-191

  Petrik, P ^a,b   Biro L P ^b   Fried, M ^b   Lohner, T ^b   Berger, R ^a,c   Schneider, C ^d   Gyulai, J ^b,d   Ryssel, H ^a,d  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^c SIEMENS AG   (Germany)

^d FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

Deposition; Ellipsometry; Polysilicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; MORPHOLOGY; SURFACE ROUGHNESS;

EFFECTIVE MEDIUM APPROXIMATION (EMA); ROOT MEAN SQUARE (RMS);

POLYSILANES;

EID: 0032473236     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00349-0     Document Type: Article

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