SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 104-110

Dependence of structural features on substrates in Co/Cu multilayers

(5) Li, Boquan a Shen, Honglie b Saitoh, Yoshiyuki a Fujimoto, Toshiyuki a Kojima, Isao a

a NATL INST OF MAT AND CHEM RES (Japan)

b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY (China)

Author keywords

Multilayers; Surface and interface roughness; X ray total reflection analysis

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; COBALT; COPPER; DEPOSITION; ELECTRON BEAMS; EVAPORATION; INTERFACES (MATERIALS); MAGNETORESISTANCE; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE ROUGHNESS;

GIANT MAGNETORESISTANCE; X RAY TOTAL REFLECTION ANALYSIS;

METALLIC SUPERLATTICES;

EID: 0032473213 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00747-5 Document Type: Article

Times cited : (13)

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