Synchrotron-radiation-induced formation of salt particles on an X-ray lithography mask

Journal of Synchrotron Radiation

Volumn 5, Issue 3, 1998, Pages 1141-1143

  Utsumi, Yuichi ^a   Takahashi, Jun Ichi ^a   Hosokawa, Teruo ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Atmosphere; Contamination; Hard X ray; Photochemical reaction; X ray lithography

Indexed keywords

EID: 0032398327     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049597017603     Document Type: Article

References (5)

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