Defect-free x-ray masks for 0.2-μm large-scale integrated circuits

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4328-4331

  Okada, I ^a   Saitoh, Y ^a,b   Sekimoto, M ^a   Ohkubo, T ^a,b   Matsuda, T ^a  

^a NTT CORPORATION   (Japan)

^b NTT Advanced Technology Corporation

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000713858     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589046     Document Type: Article

References (11)

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