Anisotropic etching of silicon in saturated TMAHW solutions for IC-compatible micromachining

Sensors and Materials

Volumn 10, Issue 4, 1998, Pages 201-212

  Sarro, P M ^a   Brida, S ^a   Ashruf, C M A ^b   Vlist, W V D ^a   Zeijl, H V ^a  

^a UNIVERSITY OF TRENTO   (Italy)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

TMAHW solutions; Aluminum passivation; Anisotropic etching of silicon; Bulk micromachining

Indexed keywords

EID: 0032389784     PISSN: 09144935     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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