Recent development and application of the XSTM

Surface Review and Letters

Volumn 5, Issue 3-4, 1998, Pages 797-802

  Hirayama, H ^a   Einaga, Y ^a,b   Koike, M ^a,c   Takayanagi, K ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032356023     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0218625x98001171     Document Type: Article

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