Surface cleaning with hydrogen plasma for low-defect-density ZnSe homoepitaxial growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2539-2545

  Ohno, Tetsuichiro ^a   Ohki, Akira ^a   Matsuoka, Takashi ^b  

^a NTT CORPORATION   (Japan)

^b Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032337234     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581378     Document Type: Article

References (16)

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