Effect of TiOX nucleation layer on crystallization of Bi4Ti3O12 films

Integrated Ferroelectrics

Volumn 18, Issue 1-4, 1997, Pages 319-328

  Neumayer, Deborah A ^a   Duncombe, Peter R ^a   Laibowitz, Robert B ^a   Saenger, Katherine L ^a   Purtell, Robert ^a   Ott, John A ^a   Shaw, Thomas M ^a   Grill, Alfred ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Bismuth titanate; Chemical solution deposition; Ferroelectric

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CRYSTAL ORIENTATION; CRYSTALLIZATION; DEPOSITION; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; HYSTERESIS; NUCLEATION; POLARIZATION; SOLUTIONS; TITANIUM OXIDES;

BISMUTH TITANATE; FERROELECTRIC HYSTERESIS; REMANENT POLARIZATION; SOLUTION DEPOSITION;

DIELECTRIC FILMS;

EID: 0031378155     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708221709     Document Type: Article

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