Chemical solution deposition (CSD) and characterization of ferroelectric and dielectric thin films

Integrated Ferroelectrics

Volumn 22, Issue 1-4, 1998, Pages 1-11

  Solayappan, N ^a   Joshi, V ^a   DeVilbiss, A ^a   Bacon, J ^a   Cuchiaro, J ^a   McMillan, L ^a   Paz De Araujo, C ^a  

^a Symetrix Corporation   (United States)

Author keywords

Chemical Solution Deposition; LSMCD; MOD; SBT; Y1

Indexed keywords

DECOMPOSITION; DEPOSITION; FERROELECTRIC MATERIALS; ORGANOMETALLICS; THIN FILMS;

CHEMICAL SOLUTION DEPOSITION (CSD); LIQUID SOURCE MISTED CHEMICAL DEPOSITION (LSMCD); METAL-ORGANIC DECOMPOSITION (MOD);

DIELECTRIC FILMS;

EID: 0032307982     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589808208024     Document Type: Article

References (4)

1. C.A. Araujo, J. D. Cuchiaro, L. D. McMillan, M.C. Scott and J.F. Scott, Nature, 374, 627 (1995)
2. R.E. Jones, Solid State Technology, 40, 201 (1997)
3. N. Solayappan, L.D. McMillan, C.A. Araujo and R. Grant, Integrated Ferroelectrics, 18, 127 (1997)
4. V. Joshi, N. Solayappan, W. Hartner, G. Schindler, C. Dehm, C. Mazure and G. Derbenwick, Presented in ISIF '98, Monterey, CA.