Chromium and nickel ion irradiation effects on the low- and high-temperature metal-semiconductor transitions in (V1-xCrx)2O3 ceramics

Journal of Applied Physics

Volumn 80, Issue 10, 1996, Pages 5646-5652

  Kokabi, H R ^a,c   Studer, F ^b  

^a SCHNEIDER ELECTRIC   (France)

^b LABORATOIRE CRISMAT   (France)

^c SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHARACTERIZATION; CHROMIUM; CRYSTAL STRUCTURE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY MEASUREMENT; ION BOMBARDMENT; IONS; NICKEL; PHASE TRANSITIONS; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

BILAYERED STRUCTURE; DOPING RATES; FLUENCES; IRON IRRADIATION EFFECTS; METAL SEMICONDUCTOR TRANSITIONS; NEGATIVE TEMPERATURE COEFFICIENT BEHAVIOR; POSITIVE TEMPERATURE COEFFICIENT TRANSITION;

CERAMIC MATERIALS;

EID: 6144259221     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363616     Document Type: Review

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