Soft X-ray ellipsometer using transmission multilayer polarizers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3443, Issue , 1998, Pages 117-127

  Haga, Tsuneyuki ^a   Utsumi, Yuichi ^b   Itabashi, Seiichi ^a  

^a NTT CORPORATION   (Japan)

^b Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

Ellipsometer; Silicon on insulator (SOI); Soft X ray; Transmission multilayers

Indexed keywords

ATOMIC SPECTROSCOPY; ELLIPSOMETRY; LIGHT; LIGHT SOURCES; LIGHTING; MOLECULAR SPECTROSCOPY; OPTICAL INSTRUMENTS; POLARIMETERS; POLARIZATION; SPECTRUM ANALYSIS; THICKNESS MEASUREMENT; ULTRAVIOLET SPECTROSCOPY; X RAYS; ELECTROMAGNETIC WAVE TRANSMISSION; LIGHT POLARIZATION; LIGHT REFLECTION; MONOCHROMATORS; MULTILAYERS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SYNCHROTRON RADIATION; X RAY ANALYSIS;

ELLIPSOMETER; ELLIPSOMETRIC ANGLES; FULL CONTROLS; HIGH SENSITIVITIES; INTERFERENCE REGIONS; LINEAR POLARIZERS; MO/SI MULTILAYERS; MULTILAYER POLARIZERS; PHASE RETARDATIONS; PHASE RETARDERS; PROBE BEAMS; SI LAYERS; SILICON ON INSULATOR (SOI); SOFT X-RAY; SOI SUBSTRATES; TRANSMISSION MULTILAYERS; TRANSMISSIVE MULTILAYER POLARIZERS; X RAY ELLIPSOMETRY;

MULTILAYERS; ELLIPSOMETRY;

EID: 0032299155     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.333605     Document Type: Conference Paper

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