Magnetic and transport properties of sputtered Fe/Si multilayers

European Physical Journal B

Volumn 5, Issue 1, 1998, Pages 61-66

  Tong, L N ^a   Pan, M H ^a   Wu, J ^a   Wu, X S ^a   Du, J ^a   Lu, M ^a   Feng, D ^a   Zhai, H R ^a   Xia, H ^b  

^a NANJING UNIVERSITY   (China)

^b GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS   (China)

Author keywords

72.15.Gd Galvanomagnetic and other magnetotransport effects; 73.40.Sx Metal semiconductor metal structures

Indexed keywords

ANTIFERROMAGNETISM; IRON; MAGNETIC PROPERTIES; MAGNETORESISTANCE; SEMICONDUCTING SILICON; SPUTTERING; TRANSPORT PROPERTIES;

MULTILAYERS;

EID: 0032295445     PISSN: 14346028     EISSN: None     Source Type: Journal    
DOI: 10.1007/s100510050419     Document Type: Article

References (27)

1. M.N. Baibich, J.M. Broto, A. Fert, F. Nguyen Van Dau, F. Petroff, P. Etienne, G. Creuzet, A. Friederich, J. Charelas, Phys. Rev. Lett 61 2472 (1988).
2. S. Toscano, et al., J. Magn. Magn. Mater. 114, L6 (1992).
3. E.E. Fullerton, et al., J. Magn. Magn. Mater. 117. L301 (1992).
4. J.E. Mattson, et al., Phys. Rev. Lett. 71, 185 (1993).
5. B. Briner, M. Landolt, Phys. Rev. Lett. 73, 340 (1994).
6. K. Inomata, S.N. Okuno, Y. Saito, K. Yusu, J. Magn. Magn. Mater. 156, 219 (1996).
7. A. Chaiken, R.P. Michel, M.A. Wall, Phys. Rev. B 53, 5518 (1996).
8. J.A. Carlisle, et al., Phys. Rev. B 53, R8824 (1996).
9. J. Kohlhepp, F.J.A. den Broeder, J. Magn. Magn. Mater. 156, 261 (1996).
10. E.E. Fullerton, S.D. Bader, Phys. Rev. B 53, 5112 (1996).
11. K. Inomata, K. Yusu, Y. Saito, Phys. Rev. Lett. 74, 1863 (1995).
12. F.J.A. den Broeder, J. Kohlhepp, Phys. Rev. Lett. 75, 3026 (1995).
13. J. Kohlhepp, F.J.A. den Broeder, M. Valkier, A. Van der Graaf, J. Magn. Magn. Mater. 165, 431 (1997).
14. J.A. Carlisle, A. Chaiken, R.P. Michel, L.J. Terminello, J.J. Jia, T.A. Callcotl, D.L. Ederer, Phys. Rev. B 53, R8824 (1996).
15. R. Klasges, C. Carbone, W. Eberhardt, C. Pampuch, O. Rader, T. Kachel, W. Gudat, Phys. Rev. B 56, 10801 (1997).
16. D.B. Cllity, Elements of X-Ray Diffraction (edited by Addison-Wesley, 1978, London).
17. G. Marchal, Ph. Mangin, Ch. Janot, Solid State Commun. 18, 739 (1976).
18. J.D. Jarratt, T.J. Klemmer, J.A. Barnard, J. Appl. Phys. 81, 5793 (1997).
19. R.V. Leauwen, C.D. England, J.R. Dutcher, C.M. Falco, W.R. Bennett, B. Hillebrands, J. Appl. Phys. 67, 4910 (1990).
20. J.R. Childress, C.L. Chier, A.F. Jankowski, Phys. Rev. B 45, 2855 (1992).
21. S.S.P. Parkin, E-MRS spring meeting, strasbourg, Mag 90, Paper c-//-2.
22. C. Cowache, et al., Phys. Rev. B 53, 15027 (1996).
23. B. Dieny, et al., Phys. Rev. B 45, 806 (1992).
24. T.R. Mcguire, R.I. Potter, IEEE Trans. Mag. MAG-11, 1018 (1975).
25. K.L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), p. 345.
26. B. Dieny, J. Phys. Cond. Matter 4, 8009 (1992).
27. J.M. Colino, I.K. Schuller, V. Korenirski, K.V. Rao, Phys. Rev. B 54, 13030 (1996).