Plasma enhanced chemical vapor deposition synthesizing carbon nitride hard thin films

Chinese Physics Letters

Volumn 15, Issue 12, 1998, Pages 913-915

  Zhang, Zhi Hong ^a   Guo, Huai Xi ^a   Meng, Xian Quan ^a   Ye, Ming Sheng ^a   Zhang, Wei ^a   Fan, Xiang Jun ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON FILMS; NITRIDES; PLASMA CVD; SILICON CARBIDE; THIN FILMS; VICKERS HARDNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE THIN FILMS; HARD THIN FILMS; VICKER HARDNESS; X-RAY PHOTOELECTRONS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0032282584     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/15/12/019     Document Type: Article

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