Design and fabrication of optical MEMS using a four-level, planarized, surface-micromachined polycrystalline silicon process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3276, Issue , 1998, Pages 48-55

  Michalicek, M Adrian ^a   Comtois, John H ^a   Schriner, Heather K ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

ARMD; FBMD; MEMS; Metallization; Micromirrors; MOEMS; Optical MEMS; Planarization; SUMMiT

Indexed keywords

CHEMICAL MECHANICAL POLISHING; METALLIZING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MIRRORS; POLYSILICON; SPUTTERING;

MICROMIRRORS; OPTICAL MICROELECTROMECHANICAL SYSTEMS (MEMS);

ELECTROOPTICAL DEVICES;

EID: 0032226225     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.302408     Document Type: Conference Paper

References (7)

1. Multi-layer enhancement to polysilicon surface micromachining technology
2. Surface micromachined microengine
3. Development of advanced second-generation micromirror devices fabricated in a four-level, planarized surface-micromachined polycrystalline silicon process
4. Application of chemical-mechanical polishing to planarization of surface-micromachined devices
5. Design, fabrication, modeling, and testing of a surface-micromachined micromirror device
6. Advanced modeling of micromirror devices
7. Design and characterization of next-generation micromirrors fabricated in a four-level, planarized surface-micromachined polycrystalline silicon process