Design and characterization of next-generation micromirrors fabricated in a four-level, planarized surface-micromachined polycrystalline silicon process

Proceedings of the Annual IEEE International Conference on Innovative Systems in Silicon

Volumn , Issue , 1997, Pages 144-154

  Michalicek, M Adrian ^a   Comtois, John H ^a   Barron, Carole Craig ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MIRRORS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; SPUTTERING;

CHEMICAL MECHANICAL POLISHING (CMP); MICROMIRROR DEVICES;

LIGHT MODULATORS;

EID: 0031373263     PISSN: 10632204     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)