Development of advanced second-generation micromirror devices fabricated in a four-level, planarized surface-micromachined polycrystalline silicon process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3292, Issue , 1998, Pages 71-80

  Michalicek, M Adrian ^a   Comtois, John H ^a   Schriner, Heather K ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

CMP planarization; MEMS; Micromirrors; MOEMS; Optical MEMS; Spatial light modulators; SUMMiT

Indexed keywords

CHEMICAL MECHANICAL POLISHING; LIGHT MODULATION; METALLIZING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POLYCRYSTALLINE MATERIALS; SURFACES;

MICROELECTROMECHANICAL SYSTEMS; MICROMIRROR DEVICES; PLANARIZATION; POLYSILICON PROCESSES;

MIRRORS;

EID: 0032224556     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.305509     Document Type: Conference Paper

References (7)

1. Surface micromachined microengine
2. Design, fabrication, modeling, and testing of a surface-micromachined micromirror device
3. Advanced modeling of micromirror devices
4. Interferometric characterization of the flexure beam micromirror device
5. Design and characterization of next-generation micromirrors fabricated in a four-level, planarized, surface-micromachined polycrystalline silicon process
6. Application of chemical-mechanical polishing to planarization of surface-micromachined devices