메뉴 건너뛰기




Volumn 34, Issue 23, 1998, Pages 2243-2244

High-responsivity porous-SiC thin-film pn junction photodetector

Author keywords

[No Author keywords available]

Indexed keywords

HIGH TEMPERATURE OPERATIONS; POROUS SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR JUNCTIONS; SILICON CARBIDE; SUBSTRATES; THIN FILMS;

EID: 0032202797     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19981547     Document Type: Article
Times cited : (17)

References (9)
  • 3
    • 0031121623 scopus 로고    scopus 로고
    • Microstructure and photoluminescence of electrochemically etched porous SiC
    • JESSENSKY, O., MULLER, F., and GOSELE, U.: 'Microstructure and photoluminescence of electrochemically etched porous SiC', Thin Solid Films, 1997, 297, pp. 224-228
    • (1997) Thin Solid Films , vol.297 , pp. 224-228
    • Jessensky, O.1    Muller, F.2    Gosele, U.3
  • 4
    • 0030268828 scopus 로고    scopus 로고
    • Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review
    • CASADY, B., and JOHNSON, R.W.: 'Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review', Solid-State Electron., 1996, 39, (10), pp. 1409-1422
    • (1996) Solid-State Electron. , vol.39 , Issue.10 , pp. 1409-1422
    • Casady, B.1    Johnson, R.W.2
  • 6
    • 0027114191 scopus 로고
    • Fabrication of MSM photodetector on porous silicon using micromachined mask
    • YU, L.Z., and WIE, C.R.: 'Fabrication of MSM photodetector on porous silicon using micromachined mask', Electron. Lett., 1992, 28, (10), pp. 911-913
    • (1992) Electron. Lett. , vol.28 , Issue.10 , pp. 911-913
    • Yu, L.Z.1    Wie, C.R.2
  • 7
    • 0027910975 scopus 로고
    • Rapid-thermal-oxidised porous Si photodetectors
    • TSAI, C.K., LI, H., and CAMPBELL, J.C.: 'Rapid-thermal-oxidised porous Si photodetectors', Electron. Lett., 1993, 29, (1), pp. 134-136
    • (1993) Electron. Lett. , vol.29 , Issue.1 , pp. 134-136
    • Tsai, C.K.1    Li, H.2    Campbell, J.C.3
  • 8
    • 0029274717 scopus 로고
    • Epitaxial growth and electrical characteristics of β-SiC on Si by low-pressure rapid thermal chemical vapor deposition
    • HWANG, J.D., FANG, Y.K., SONG, V.J., and YAUNG, D.N.: 'Epitaxial growth and electrical characteristics of β-SiC on Si by low-pressure rapid thermal chemical vapor deposition', Jpn. J. Appl Phys., 1995, 34, pp. 1447-1450
    • (1995) Jpn. J. Appl Phys. , vol.34 , pp. 1447-1450
    • Hwang, J.D.1    Fang, Y.K.2    Song, V.J.3    Yaung, D.N.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.