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Volumn 193, Issue 3, 1998, Pages 293-299
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Composition control of InGaAsP in metalorganic chemical vapor deposition using tertiarybutylphosphine and tertiarybutylarsine
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Author keywords
InGaAsP; MOCVD; TBA; TBP
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Indexed keywords
COMPOSITION EFFECTS;
CRYSTAL GROWTH;
CRYSTAL LATTICES;
MATHEMATICAL MODELS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTOR GROWTH;
SPECIFIC HEAT OF SOLIDS;
INDIUM GALLIUM ARSENIDE PHOSPHIDE;
TERTIARYBUTYLARSINE;
TERTIARYBUTYLPHOSPHINE;
SEMICONDUCTING INDIUM COMPOUNDS;
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EID: 0032183644
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(98)00556-9 Document Type: Article |
Times cited : (10)
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References (16)
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