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Volumn 193, Issue 3, 1998, Pages 293-299

Composition control of InGaAsP in metalorganic chemical vapor deposition using tertiarybutylphosphine and tertiarybutylarsine

Author keywords

InGaAsP; MOCVD; TBA; TBP

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL GROWTH; CRYSTAL LATTICES; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR GROWTH; SPECIFIC HEAT OF SOLIDS;

EID: 0032183644     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00556-9     Document Type: Article
Times cited : (10)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.