Scaleable process for pulsed DC magnetron sputtering of non-conducting oxides

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1996, Pages 168-173

  Schneider, J M ^a   Sproul, W D ^a   Lefkow, A R T ^a   Matthews, A ^a   Graham, M E ^a   Rechner, J ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ELECTRIC INSULATING COATINGS; NITRIDES; PRESSURE CONTROL; SPUTTER DEPOSITION; ZIRCONIA;

OXIDE FILMS; PARTIAL PRESSURE CONTROL; PULSED DIRECT CURRENT MAGNETRON SPUTTERING; REACTIVE DEPOSITION;

MAGNETRON SPUTTERING;

EID: 0030411110     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)