Susceptor-based rapid thermal processing system and its suicide application

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 10 PART A, 1998, Pages

  Yoo, Woo Sik ^a   Atanos, Ashur J ^a   Daviet, Jean Francois ^a  

^a MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

CoSi; Rapid thermal processing (RTP); Sheet resistance; Suicide; Susceptor based RTP; Thermal budget; Throughput; TiSi; Uniformity

Indexed keywords

ELECTRIC RESISTANCE; RAPID THERMAL ANNEALING; SEMICONDUCTOR DEVICE MANUFACTURE; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT; THERMAL PRINTING;

COBALT SILICIDE; SILICIDE; SUSCEPTOR; THERMAL BUDGET; TITANIUM SILICIDE; WATER TO WATER TEMPERATURE REPEATABILITY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0032182040     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l1135     Document Type: Article

References (7)

1. F. Roozeboom: Advances in Rapid Thermal & Integrated Processing, ed. F. Roozeboom (The Netherlands, 1996) NATO ASI Series E Vol. 318, Chap. 1.
2. R. Schenk, V. Sargunas and R. Piotrowski: Proc. 5th Int. Conf. on Advanced Thermal Processing of Semiconductors (New Orleans, 1997) p. 124.
3. D. P. DeWitt, F. Y. Sorrell and J. K. Elliott: Mater. Res. Soc. Symp. Proc. 470 (1997) 3.
4. M. Oh, B. Nguyenphu, R. Huang, Y. Ma, S. Chaplin, D. Brady and C. Lee: Mater. Res. Soc. Symp. Proc. 470 (1997) 43.
5. J.-M. Dilhac: Advances in Rapid Thermal & Integrated Processing, ed. F. Roozeboom (The Netherlands, 1996) NATO ASI Ser. E, Vol. 318, Chap. 5.
6. A. Karouri, Q. Zhang, A. Romanowski, G. A. Rozgonyi, P. Rushbrook and S. Savas: Proc. 5th Int. Conf. on Advanced Thermal Processing of Semiconductors (New Orleans, 1997) p. 399.
7. W. S. Yoo, A. J. Atanos and D. M. Whitworth: 6th Int. Conf. on Advanced Thermal Processing of Semiconductors (RTP'98), Kyoto, Japan, 1998, to be presented.