A fully integrated aluminum dual damascene process using a new double stopper structure

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 10, 1998, Pages 5526-5532

  Anand, Minakshisundaran B ^a   Nakamura, Naofumi ^a   Wada, Jun Ichi ^a   Oikawa, Yasushi ^a   Katata, Tomio ^a   Shiba, Katsuyasu ^a   Shibata, Hideki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Aluminum; Damascene; Dual damascene; Inlaid interconnects; Interconnects; Stopper

Indexed keywords

ALUMINUM; CAPACITANCE; ETCHING; PROCESS CONTROL; SILICON NITRIDE;

DUAL DAMASCENE WIRING; ETCH STOPPERS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0032181653     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5526     Document Type: Article

References (5)

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