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Volumn 26, Issue 5, 1998, Pages 1583-1585

Fast, zero-dimensional simulation of radio frequency glow discharges for quick estimates of fluorine concentrations

Author keywords

Plasma materials; Processing applications

Indexed keywords

COMPUTER SIMULATION; ELECTRONS; FLUORINE; FLUOROCARBONS; FUNCTIONS; MATHEMATICAL MODELS; PLASMAS;

EID: 0032181537     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.736067     Document Type: Article
Times cited : (4)

References (12)
  • 9
    • 0021494806 scopus 로고    scopus 로고
    • 4 plasma etching silicon," J. Appl. Phys., vol. 56, no. 5, pp. 1522-1531, Sept. 1984.
    • D. Edelson and D. L. Flamm, "Computer simulation of a CF4 plasma etching silicon," J. Appl. Phys., vol. 56, no. 5, pp. 1522-1531, Sept. 1984.
    • "Computer Simulation of A CF
    • Edelson, D.1    Flamm, D.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.