SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Applied Physics

Volumn 56, Issue 5, 1984, Pages 1522-1531

Computer simulation of a CF4 plasma etching silicon

(2) Edelson, David a Flamm, Daniel L a

a LUCENT TECHNOLOGIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING - COMPUTER SIMULATION; FLUOROHYDROCARBONS; PLASMAS - APPLICATIONS;

SEMICONDUCTING SILICON;

EID: 0021494806 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.334108 Document Type: Article

Times cited : (152)

References (38)

1
- 0019730293
- (1981) Plasma Chem. Plasma Proc , vol.1 , pp. 317
- Flamm, D.L.¹ Donnelly, V.M.²

2
- 0019848108
- (1981) Science , vol.214 , pp. 981
- Edelson, D.¹

3
- 0018500871
- (1979) J. Appl. Phys , vol.50 , pp. 4982
- Smolinsky, G.¹ Flamm, D.L.²

4
- 0019565711
- (1981) J. Electrochem. Soc , vol.128 , pp. 1077
- Harper, J.M.F.¹ Cuomo, J.J.² Leary, P.A.³ Summa, G.M.⁴ Kaufman, H.R.⁵ Bresnock, F.J.⁶

5
- 0018986235
- (1981) J. Vac. Sci. Technol , vol.18 , pp. 349
- Mayer, T.M.¹ Barker, R.A.² Whitman, L.J.³

6
- 0020180220
- (1982) J. Electrochem. Soc , vol.129 , pp. 2045
- Smith, D.L.¹ Bruce, R.H.²

7
- 37049052748
- (1963) Trans. Faraday Soc , vol.59 , pp. 2455
- Bibby, M.M.¹ Carter, G.²

8
- 0015669803
- (1973) J. Appl. Phys , vol.44 , pp. 3980
- Vriens, L.¹

9
- 0019075437
- (1980) J. Appl. Phys , vol.51 , pp. 5300
- Morgan, W.L.¹ Vriens, L.²

10
- 0019073774
- (1980) J. Appl. Phys , vol.51 , pp. 5295
- Ligthart, F.A.S.¹ Keijser, R.A.J.²

11
- 0041631732
- (1976) Comput. Chem , vol.1 , pp. 29
- Edelson, D.¹

12
- 0000514062
- (1982) Phys. Rev. A , vol.25 , pp. 1420
- Winters, H.F.¹ Inokuti, M.²

13
- 84951375491
- (in press)
- Hunter, S.R.¹ Christophorou, L.G.²

14
- 84951375490
- Gaseous Dielectrics Research and Applications
- Semiannual Report, Contract No. W-7405-eng-26, Oak Ridge National Laboratory Report ORNL/ TM-8368, July
- (1982)
- Christophorou, L.G.¹ James, D.R.² Mathis, R.A.³ Sauers, I.⁴ Hunter, S.R.⁵ Pace, M.O.⁶ Bouldin, D.W.⁷ Spyrou, S.M.⁸ Fatheddin, A.⁹ Lakdawala, V.K.¹⁰ Adcock, J.L.¹¹ Easterly, C.E.¹² Griffin, G.D.¹³

15
- 0015345940
- (1972) J. Phys. D , vol.5 , pp. 983
- Naidu, M.S.¹ Prasad, A.N.²

16
- 0002306486
- (1981) Plasma Chem. Plasma Proc , vol.1 , pp. 37
- Flamm, D.L.¹

17
- 0004094138
- (Wiley, New York,Chap1.
- (1973) The Mobility and Diffusion of Ions in Gases
- McDaniel, E.W.¹ Mason, E.A.²

18
- 0003738124
- (Wiley, New York)
- (1966) Introduction to Electrical Discharges in Gases
- Brown, S.C.¹

19
- 0019562973
- (1981) J. Appl. Phys , vol.52 , pp. 3633
- Flamm, D.L.¹ Donnelly, V.M.² Mucha, J.A.³

20
- 0020126588
- (1982) J. Appl. Phys , vol.53 , pp. 3799
- Vasile, M.J.¹ Stevie, F.A.²

21
- 84951375488
- (unpublished)
- (1980)
- Flamm, D.L.¹ Donnelly, V.M.²

22
- 0020175544
- (1982) J. Vac. Sci. Technol , vol.21 , pp. 817
- Donnelly, V.M.¹ Flamm, D.L.² Collins, G.³

23
- 84951375486
- Decomposition and Recombination of [formula omitted] in Plasma Etching
- Electrochemical Society, Denver, CO, October 11-16 1981
- presented at 3rd Symposium on Plasma Processing
- Turban, G.¹ Pasquereau, J.² Rapeaux, M.³ Catherine, Y.⁴ Grolleau, B.⁵

24
- 84951375495
- (private communication)
- Turban, G.¹ Pasquereau, J.² Rapeaux, M.³ Catherine, Y.⁴ Grolleau, B.⁵

25
- 0018455110
- (1979) Solid State Technol , vol.22 , pp. 109
- Flamm, D.L.¹

26
- 0018986229
- (1981) J. Vac. Sci. Technol , vol.18 , pp. 353
- Coburn, J.W.¹ Chen, M.²

27
- 0019693051
- (1981) Appl. Math. Model , vol.5 , pp. 432
- Kramer, M.A.¹ Calo, J.M.² Rabitz, H.³

28
- 0001149435
- (1978) J. Chem. Phys , vol.69 , pp. 5180
- Hwang, J.T.¹ Dougherty, E.P.² Rabitz, S.³ Rabitz, H.⁴

29
- 0020114383
- (1982) J. Appl. Phys , vol.53 , pp. 2923
- Kushner, M.J.¹

30
- 84985386790
- (1979) Intern. J. Chem. Kinetics , vol.11 , pp. 775
- Rossi, M.¹ Golden, D.M.²

31
- 84951375494
- [private communication of RRKM calculations of homogeneous [formula omitted] recombination as a function of pressure and temperature based on molecular parameters and unpublished data from their laboratory
- (1980)
- Rossi, M.¹ Golden, D.M.²

32
- 0343279976
- (1982) Bull. Am. Phys. Soc , vol.27 , pp. 97
- Flamm, D.L.¹ Donnelly, V.M.²

33
- 0020594814
- (1983) J. Vac. Sci. Technol. B , vol.1 , pp. 23
- Flamm, D.L.¹ Donnelly, V.M.² Ibbotson, D.E.³

34
- 0020751214
- (1983) J. Appl. Phys , vol.54 , pp. 2272
- de Rosny, G.¹ Mosberg, E.R.² Abelson, J.R.³ Devaud, G.⁴ Kerns, R.C.⁵

35
- 33947084915
- (1973) Ind. Eng. Chem. Fund , vol.12 , pp. 276
- Flamm, D.L.¹ Gilliland, E.R.² Baddour, R.F.³

36
- 0004320907
- Discharge Processes in the Oxygen Plasma
- Rept. AFIT/DS/78-3, Air Force Institute of Technology, Wright Patterson AFB, Ohio 45433.
- Dettmer, J.W.¹

37
- 0017526017
- (1977) J. Appl. Phys , vol.48 , pp. 3532
- Coburn, J.W.¹ Winters, H.F.² Chuang, T.J.³

38
- 49649143573
- (1973) J. Fluorine Chem , vol.2 , pp. 87
- Marcotte, R.E.¹ Hanrahan, R.J.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.