Monitoring of chemical oxide removal from silicon surfaces using a surface photovoltage technique

Electrochemical and Solid-State Letters

Volumn 1, Issue 3, 1998, Pages 130-132

  Brubaker, M ^a,b   Roman, P ^a,b   Staffa, J ^a,b   Ruzyllo, J ^a,b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; BONDING; ETCHING; HYDROCHLORIC ACID; HYDROGEN PEROXIDE; PHOTOELECTRICITY; SILICON WAFERS; SULFURIC ACID;

CHEMICAL OXIDE REMOVAL; SURFACE PHOTOVOLTAGE TECHNIQUE; SURFACE RECOMBINATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032166746     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390660     Document Type: Article

References (13)

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