Process monitoring using surface charge profiling (SCP) method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2876, Issue , 1996, Pages 162-173

  Ruzyllo, Jerzy ^a   Roman, P ^a   Staffa, J ^a   Kashkoush, I ^a   Kamieniecki, E ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IN-LINE MONITORING; SURFACE CHARGE PROFILING;

HYDROGEN; MONITORING; PROCESS CONTROL; SEMICONDUCTING SILICON; SURFACES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0030414856     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)