Surface dopant concentration monitoring using noncontact surface charge profiling

Journal of Applied Physics

Volumn 83, Issue 4, 1998, Pages 2297-2300

  Roman, P ^a   Staffa, J ^a   Fakhouri, S ^a   Brubaker, M ^a   Ruzyllo, J ^a   Torek, K ^b   Kamieniecki, E ^c  

^a The Pennsylvania State University   (United States)

^b MICRON TECHNOLOGY INC   (United States)

^c QC Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001765329     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366972     Document Type: Article

References (11)

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11. J. Lagowski, A. M. Kontkiewicz, W. Henley, M. Dexter, L. Jastrzebski, and P. Edelman, Proceedings of the Fifth International Conference on Defect Recognition and Image Processing in Semiconductors and Devices (DRIP 5), Santander, Spain, September 6-10, 1993.