Plasma polymers and plasma etching group of the Centro di Studio per la Chimica dei Plasmi, Bari, Italy

Plasmas and Polymers

Volumn 3, Issue 3, 1998, Pages 177-192

  D'Agostino, Riccardo ^a   Colaprico, Vincenzo ^a   Favia, Pietro ^a   Fracassi, Francesco ^a   Lamendola, Ritalba ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EMISSION SPECTROSCOPY; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; PLASMAS; POLYMERS; SCANNING ELECTRON MICROSCOPY;

ACTINOMETRY; OPTICAL EMISSION SPECTROSCOPY; PLASMA POLYMERS; PLASMA PROCESSING; TRIODE REACTORS;

PLASMA ETCHING;

EID: 0032153926     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021891212989     Document Type: Article

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