Deposition of gold-containing siloxane thin films

Thin Solid Films

Volumn 272, Issue 1, 1996, Pages 60-63

  Fracassi, F ^a   D'Agostino, R ^a   Palumbo, F ^a   Bellucci, F ^b   Monetta, T ^b  

^a UNIVERSITY OF BARI   (Italy)

^b UNIVERSITY OF NAPLES FEDERICO II   (Italy)

Author keywords

Gold; Plasma processing and deposition; Silicon oxide; Sputtering

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; EFFECTS; ELECTRIC CONDUCTIVITY; FLOW CONTROL; GOLD; LIGHT ABSORPTION; PHYSICAL PROPERTIES; PLASMA APPLICATIONS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SPUTTERING;

DEPOSITION REACTOR; FLOW RATES; GOLD CLUSTERS; PLASMA PROCESSING; SILOXANE;

THIN FILMS;

EID: 0029754042     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)06971-2     Document Type: Article

References (10)

1. H. Biederman and L. Martinu, in R. D'Agostino (ed.), Plasma deposition, Treatment and Etching of Polymers, Academic Press, 1990, and references cited therein.
2. J. Janca and P. Pavelka, Scr. Fac. Sci. Nat. Univ. Purk. Brun., 15 (1985) 261.
3. A. Heilmann and C. Hamann, Progr. Colloid Polym. Sci., 85 (1991) 102.
4. F. Homilius, A. Heilmann, J. Werner and W. Grunewald, Phys. Status Solidi, 137 (1993) 145.
5. F. Fracassi, R. d'Agostino and P. Favia, J. Electrochem. Soc., 139 (1992) 2636.
6. R. d'Agostino, F. Cramarossa, F. Fracassi and F. Illuzzi, in R. d'Agostino (ed.), Plasma deposition, Treatment, and Etching of Polymers, Academic Press, 1990, and references cited therein.
7. P. Favia, F. Fracassi and R. d'Agostino, J. Biomater. Sci. Polym. Ed., 4 (1992) 61.
8. F. Fracassi, R. d'Agostino, P. Favia and M. van Sambeck, Plasma Source Sci. Technol., 2 (1993) 106.
9. R.W. Cohen, G.D. Cody, M.D. Coutto and B. Abeles, Phys. Rev. B, 8 (1973) 3689.
10. J. Perrin, B. Despax, V. Hanchett and E. Kay, J. Vac. Sci. Technol. A, 4 (1986) 46.