Ion beam formation under unusual conditions

IEEE Transactions on Plasma Science

Volumn 26, Issue 4, 1998, Pages 1353-1356

  Vizir, Alexey ^a,b   Oks, Efim M ^a   Brown, Lan G ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

Beam formation; Ion beams; Ion implantation; Ion sources; Plasma immersion; Surface modification

Indexed keywords

ION BEAMS; ION IMPLANTATION; PLASMA DENSITY; PLASMA DEVICES; PLASMA SHEATHS; SURFACE TREATMENT;

PLASMA IMMERSION;

ION SOURCES;

EID: 0032140239     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.725169     Document Type: Article

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