Plasma synthesis of metallic and composite thin films with atomically mixed substrate bonding

Nuclear Inst. and Methods in Physics Research, B

Volumn 80-81, Issue PART 2, 1993, Pages 1281-1287

  Brown, I G ^a   Anders, A ^a   Anders, S ^a   Dickinson, M R ^a   Ivanov, I C ^b   MacGill, R A ^a   Yao, X Y ^a   Yu, K M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000614412     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(93)90782-2     Document Type: Article

References (29)

1. Ion bombardment during thin film deposition and its influence on mechanical and chemical surface properties
2. Multiply stripped ion generation in the metal vapor vacuum arc
3. Vacuum arc ion charge-state distributions
4. Thin Film Synthesis Using Miniature Pulsed Metal Vapor Vacuum arc Plasma Guns
5. High-rate deposition of Al2O3 films using modified cathodic arc plasma deposition processes