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Volumn 45, Issue 8, 1998, Pages 1855-1858

A new characterization method for hot-carrier degradation in DMOS transistors

Author keywords

Capacitance measurements; Hot carriers; Ldmos device

Indexed keywords

CAPACITANCE MEASUREMENT; COMPUTER SIMULATION; DEGRADATION; GATES (TRANSISTOR); HOT CARRIERS; OXIDES;

EID: 0032138065     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.704394     Document Type: Article
Times cited : (9)

References (8)
  • 1
    • 0002649282 scopus 로고    scopus 로고
    • BCD technologies for VLSI smart power IC's
    • C. Contiero, BCD technologies for VLSI smart power IC's, in Proc. ESSDERC'95, p. 89.
    • Proc. ESSDERC'95 , pp. 89
    • Contiero, C.1
  • 2
    • 0026188098 scopus 로고
    • An overview of smart power technology
    • B. J. Baliga, An overview of smart power technology, IEEE Trans. Electron Devices, vol. 38, p. 1568, July 1991.
    • (1991) IEEE Trans. Electron Devices , vol.38 , pp. 1568
    • Baliga, B.J.1
  • 6
    • 0029307455 scopus 로고
    • Measurement and simulation of hot carrier degradation in PMOSFET by gate capacitance
    • C. H. Ling, B. P. Seah, S. Samudra, and H. Gan, Measurement and simulation of hot carrier degradation in PMOSFET by gate capacitance, IEEE Trans. Electron Devices, vol. 42, p. 928, May 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , pp. 928
    • Ling, C.H.1    Seah, B.P.2    Samudra, S.3    Gan, H.4
  • 8
    • 0030130112 scopus 로고    scopus 로고
    • Extraction of lateral device parameters and channel doping profile of vertical doublediffused MOS transistors
    • J. Kim, B. Ihn, B. Kim, K. Lee, W. Lee, and S. Lee, Extraction of lateral device parameters and channel doping profile of vertical doublediffused MOS transistors, Solid-State Electron., vol. 39, no. 4, p. 541, 1996.
    • (1996) Solid-State Electron. , vol.39 , Issue.4 , pp. 541
    • Kim, J.1    Ihn, B.2    Kim, B.3    Lee, K.4    Lee, W.5    Lee, S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.