Preliminary results on x-ray lithography using a compact plasma focus

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3183, Issue , 1997, Pages 123-127

  Lee, S ^a   Feng, X ^a   Zhang, G X ^a   Lee, P ^b   Liu, M H ^a   Serban, A ^b   SVSpringham, ^a   Wong, T K S ^b   Wira, K ^b   Selvam, C ^a   Thang, A ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Lithography; Plasma focus; X ray source

Indexed keywords

DIAMONDS; ELECTRON SOURCES; INERT GASES; LITHOGRAPHY; NEON; PLASMA DEVICES; SEMICONDUCTOR DIODES; X RAY APPARATUS; X RAY LITHOGRAPHY; X RAYS;

COMPACT PLASMA FOCUSES; K SHELLS; MICRO LITHOGRAPHIES; PHOTOCONDUCTING DIAMOND DETECTORS; PIN DIODES; PLASMA FOCUS; POINT SOURCES; REPETITION RATES; TOTAL ENERGIES; WAVELENGTH RANGES; WORKING GASSES; X-RAY SOURCE;

PLASMAS;

EID: 57649134329     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.280532     Document Type: Conference Paper

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