Near-room-temperature selective oxidation on GaAs using photoresist as a mask

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 8 SUPPL. B, 1998, Pages

  Wang, Hwei Heng ^a   Wang, Yeong Her ^a   Houng, Mau Phon ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Compound semiconductor; Liquid phase oxidation; Photoresist mask; Selective oxidation

Indexed keywords

ANNEALING; ELECTRIC INSULATING MATERIALS; LOW TEMPERATURE OPERATIONS; MASKS; OXIDATION; PHOTORESISTS; X RAY PHOTOELECTRON SPECTROSCOPY;

LIQUID PHASE CHEMICALLY ENHANCED OXIDATION (LPCEO); SELECTIVE OXIDATION;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0032131616     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l988     Document Type: Article

References (19)

1. E. F. Schubert, M. Passlack, M. Hong, J. Mannerts, R. L. Oplia, L. N. Preiffer, K. W. West, C. G. Bethea and G. J. Zydzik: Appl. Phys. Lett. 64 (1994) 2976.
2. D. L. Huffaker, D. G. Deppe, K. Kumar and T. J. Rogers: Appl. Phys. Lett. 65 (1994) 97.
3. M. J. Ries, T. A. Richard, S. A. Maranowski, N. J. Holonyak and E. I. Chen: Appl. Phys. Lett. 65 (1994) 740.
4. M. Grabherr, R. Jaeger, R. Michalzik, B. Weigl and G. Reiner: IEEE Photon. Technol. Lett. 9 (1997) 1304.
5. Y. Hiratani, Y. Ohki and K. Akita: J. Cryst. Growth 111 (1991) 570.
6. J. M. Dallesasse, N. Holonyak, A. R. Sugg, T. A. Richard and N. El-Zein: Appl. Phys. Lett. 57 (1990) 2844.
7. Y. Hiratani, Y. Ohki, Y. Sugimoto, K. Akita, M. Taneya and H. Hidaka: Jpn. J. Appl. Phys. 29 (1990) L1360.
8. T. H. Oh, D. L. Huffaker, L. A. Graham, H. Deng and D. G. Deppe: Electron. Lett. 32 (1996) 2024.
9. R. Nakamura and H. Ikoma: Jpn. J. Appl. Phys. 35 (1996) L8.
10. P. A. Bertrand: J. Electrochem. Soc. 132 (1985) 973.
11. N. Basu and K. N. Bhat: J. Appl. Phys. 63 (1988) 5500.
12. H. H. Wang, C. J. Huang, Y. H. Wang and M. P. Houng: Jpn. J. Appl. Phys. 37 (1998) L67.
13. C. F. Yeh and C. L. Chen: Semicond. Sci. Technol. 9 (1994) 1250.
14. S. M. Bradley, R. A. Kydd and R. Yamdagni: J. Chem. Soc. Dalton. Trans. (1990) 413.
15. H. Takagi, G. Kano and I. Teramoto: J. Electrochem. Soc. 125 (1978) 579.
16. M. Passlack, E. F. Schubert, W. S. Hobson, M. Hong, N. Moriya, S. N. G. Chu, K. Konstadinidis, J. P. Mannaerts, M. L. Schnoes and G. L. Zydzik: J. Appl. Phys. 77 (1995) 686.
17. CRC Handbook of Chemistry and Physics, ed. D. R. Lide (CRC Press, Florida, 1997) Vol. 78, Chap. 4.
18. H. H. Wang, D. W. Chou, Y. H. Wang and M. P. Houng: to be published in Physica Scripta (1998).
19. G. P. Schwartz, G. J. Gualtieri, G. W. Kammoltt and B. Schwartz: J. Electrochem. Soc. 126 (1979) 1737.