Electrochemical behavior and surface morphologic changes of copper substrates in the presence of 2,5-dimercapto-1,3,4-thiadiazole: In situ EQCM and phase measurement interferometric microscopy

Journal of the Electrochemical Society

Volumn 145, Issue 7, 1998, Pages 2369-2377

  Chi, Qijin ^a   Tatsuma, Tetsu ^a,c   Ozaki, Masahide ^a   Sotomura, Tadashi ^b,c   Oyama, Noboru ^a,c  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b PANASONIC CORPORATION   (Japan)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; DISSOLUTION; ELECTROCHEMISTRY; ELECTROLYSIS; GRAVIMETRIC ANALYSIS; INTERFEROMETRY; MICROSCOPIC EXAMINATION; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SULFUR COMPOUNDS; SURFACE ROUGHNESS; SUSPENSION BRIDGES;

DIMERCAPTOTHIADIAZOLE; ELECTROCHEMICAL QUARTZ CRYSTAL MICROGRAVIMETRY (EQCM); PHASE MEASUREMENT INTERFEROMETRIC MICROSCOPY (PMIM); VOLTAMMETRY;

COPPER;

EID: 0032123099     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838645     Document Type: Article

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