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Volumn 142, Issue 3, 1998, Pages 313-318
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Theoretical model and computer simulation results of enhanced diffusion of high-temperature implanted aluminum in silicon carbide
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Author keywords
Defects; High temperature; Implant dose; Ion implantation; Numerical simulation; Silicon carbide
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Indexed keywords
ALUMINUM;
COMPUTER SIMULATION;
CRYSTAL ATOMIC STRUCTURE;
CRYSTAL DEFECTS;
CURRENT DENSITY;
DIFFUSION IN SOLIDS;
ION BOMBARDMENT;
ION IMPLANTATION;
MATHEMATICAL MODELS;
REACTION KINETICS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON CARBIDE;
MACROSCOPIC KINETIC MODEL;
SEMICONDUCTING FILMS;
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EID: 0032120255
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(98)00253-5 Document Type: Article |
Times cited : (1)
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References (11)
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