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Volumn 54, Issue 1-3, 1998, Pages 258-261
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Indium oxide film formation by O2 cluster ion-assisted deposition
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Author keywords
Cluster ions; Indium oxide film; Non critical process; Room temperature
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Indexed keywords
ANNEALING;
DEPOSITION;
ELECTRIC CONDUCTIVITY;
INDIUM COMPOUNDS;
ION BEAMS;
IONS;
OXYGEN;
SUBSTRATES;
TRANSPARENCY;
CLUSTER ION;
INDIUM TIN OXIDE FILM;
NON CRITICAL PROCESS;
OXYGEN CLUSTER ION ASSISTED DEPOSITION;
OXYGEN CLUSTER ION BEAM;
CONDUCTIVE FILMS;
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EID: 0032119663
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/S0254-0584(98)00109-6 Document Type: Article |
Times cited : (25)
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References (14)
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