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Volumn 112, Issue 1-4, 1996, Pages 83-85

SiO2 film formation at room temperature by gas cluster ion beam oxidation

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; INTERFACES (MATERIALS); OXIDATION; SILICA; SUBSTRATES; SURFACE TREATMENT; THERMAL EFFECTS; THIN FILMS;

EID: 0030563473     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01235-4     Document Type: Article
Times cited : (17)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.