![]() |
Volumn 112, Issue 1-4, 1996, Pages 83-85
|
SiO2 film formation at room temperature by gas cluster ion beam oxidation
|
Author keywords
[No Author keywords available]
|
Indexed keywords
FILM GROWTH;
INTERFACES (MATERIALS);
OXIDATION;
SILICA;
SUBSTRATES;
SURFACE TREATMENT;
THERMAL EFFECTS;
THIN FILMS;
GAS CLUSTER ION BEAM OXIDATION;
ION BEAM LITHOGRAPHY;
|
EID: 0030563473
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(95)01235-4 Document Type: Article |
Times cited : (17)
|
References (15)
|