Characteristics of polytetrafluoroethylene thin films prepared by lonization-assisted deposition

IEICE Transactions on Electronics

Volumn E81-C, Issue 7, 1998, Pages 1083-1089

  Usui, Hiroaki ^a   Koshikawa, Hiroshi ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Cu decoration; Electrical insulation; Ion beam; Ionization assisted deposition; Polytetrafluoroethylene; PTFE

Indexed keywords

CAPACITORS; CRYSTAL ORIENTATION; DEPOSITION; DIELECTRIC LOSSES; ELECTRIC INSULATION; IONIZATION OF SOLIDS; POLYTETRAFLUOROETHYLENES; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS;

IONIZATION-ASSISTED DEPOSITION (IAD) METHODS; SURFACE SMOOTHNESS;

PLASTIC FILMS;

EID: 0032118442     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

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